| Quarter > Kate Gleason Col Of Engrng > Microelectronic Engineering > Thin Film Processes > Description |
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| Course Description |
| Course Number: |
0305-643 |
Course Title: |
Thin Film Processes |
Description: |
| This course focuses on the deposition and etching of thin films of conductive and insulating materials for IC fabrication. A thorough overview of vacuum technology is presented to familiarize the student with the challenges of creating and operating in a controlled environment. Chemical Vapor Deposition (CVD) and electroplating technologies are discussed as methods of film deposition. Plasma etching and Chemical Mechanical Planarization (CMP) are studied as methods for selective removal of materials. Applications of these fundamental thin film processes to IC manufacturing are presented. (0305-320, 350) Class 3, Lab 3, Credit 4 (S, SU) |
Course Notes: |
| 0305-643 PREREQUISITES: 0305-320, 350 |
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